Plasma processor

Details Plasma processor Plasma processor

1992-01-07

1992-09-08

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31323131, 20429838, H05H 146

Patent

active

051461382

ABSTRACT:
A plasma processor comprising a plasma generation portion in which a plasma is generated by electron cyclotron resonance, a source of a right hand polarized microwave and supplying it to the plasma generation portion, and a plasma reaction portion which accommodates a substrate to be processed with the plasma generated in the plasma generation portion. Owing to the production and supply of the right hand polarized microwaves, almost all of the microwaves injected into the plasma generation portion contribute to the generation of the plasma, to increase plasma density and raise processing speed.

REFERENCES:
patent: 4609428 (1986-09-01), Fujimura
patent: 4713585 (1987-12-01), Ohno et al.
patent: 4718976 (1988-01-01), Fujimura
patent: 4721553 (1088-01-01), Saito et al.
patent: 4778561 (1988-10-01), Ghanbari
patent: 4866346 (1989-09-01), Gaudreau et al.
patent: 4877509 (1989-10-01), Ogawa et al.
patent: 4883968 (1989-11-01), Hipple et al.
patent: 4891095 (1990-01-01), Ishida et al.
patent: 4894510 (1990-01-01), Nakanishi et al.
patent: 4915979 (1990-04-01), Ishida et al.
patent: 4947085 (1990-08-01), Nakanishi et al.
patent: 4982138 (1991-01-01), Fujiwara et al.
patent: 5003152 (1991-03-01), Matsuo et al.
patent: 5022977 (1991-06-01), Matsuoka et al.
Sakamoto, "Measurement of Power Transfer Efficiency From Microwave Field To Plasma Under ECR Condition", Japanese Journal of Applied Physics, vol. 16, No. 11, Nov. 1977, pp. 1993-1998.

Affiliated with

Also associated with

Rating

Plasma processor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Plasma processor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma processor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-136316