Method of forming contact windows

Details Method of forming contact windows Method of forming contact windows

1990-10-23

1993-10-19

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156657, 156656, 156665, 437195, 437228, H01L 2100

Patent

active

052542130

ABSTRACT:
A method of forming contact windows in an insulating layer is disclosed. The contact windows extend down to an underlying metal layer which is formed under the insulating layer. The method comprises the steps of: forming an etching mask layer having openings for defining contact window regions of the insulating layer on the insulating layer; and performing an etching process using an etching gas to which a gas containing nitrogen atoms has been added, thereby etching away the contact window regions of the insulating layer through the openings of the etching mask layer to form the contact windows.

REFERENCES:
patent: 4547261 (1985-10-01), Maa et al.
patent: 4615764 (1986-10-01), Bobbio et al.
patent: 4855017 (1989-08-01), Douglas
patent: 4857141 (1989-08-01), Abe et al.
patent: 4873176 (1989-10-01), Fisher
patent: 4948459 (1990-08-01), Van Laarhoven et al.
patent: 4985373 (1991-01-01), Levinstein et al.

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