Semiconductor wafer cleaning apparatus

Details Semiconductor wafer cleaning apparatus Semiconductor wafer cleaning apparatus

1991-07-30

1993-03-23

Chaudhuri, Olik

Metal working

Barrier layer or semiconductor device making

51413, 51424, 51436, B24C 332

Patent

active

051960346

ABSTRACT:
A semiconductor wafer cleaning apparatus provided with an ice making unit and a jet nozzle for ejecting fine ice particles against a wafer held within a cleaning vessel includes an exhaust chamber having an expanded portion and connected to the cleaning vessel. Curved guide plates extend from cleaning vessel into the exhaust chamber equidistant from each other into the expanded portion to guide the jet particles into the expanded portion. A flow regulator plate having a multitude of inverted frustum-shaped tapered holes regulates the jetted particles within the cleaning bath in accordance with the downward flow direction. Further, the upward flow from the exhaust chamber along the side walls is caught by stopper plates and exhausted via exhaust ports.

REFERENCES:
patent: 4820650 (1989-04-01), Nagae et al.
patent: 4932168 (1990-06-01), Tada et al.
patent: 4974375 (1990-12-01), Tada et al.
patent: 5025597 (1991-06-01), Tada et al.
patent: 5035750 (1991-07-01), Tada et al.
patent: 5081068 (1992-01-01), Endo et al.
patent: 5129198 (1992-07-01), Kanno et al.

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