Integrated light deflector and method of fabrication therefor

Details Integrated light deflector and method of fabrication therefor Integrated light deflector and method of fabrication therefor

1993-05-14

1994-09-06

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430323, 430324, 430327, 430329, 430396, 430967, G03C 500, G03C 504

Patent

active

053447468

ABSTRACT:
An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.

REFERENCES:
patent: 4563291 (1986-01-01), Becker et al.
patent: 4687730 (1987-08-01), Eron
patent: 4716559 (1987-12-01), Hine
patent: 4861128 (1989-08-01), Ishikawa et al.
patent: 4893296 (1990-01-01), Matsumoto et al.
patent: 4901329 (1990-02-01), Leas
patent: 4950622 (1990-08-01), Kwon et al.
patent: 5001719 (1991-03-01), Trussell
E. K. Aschmoneit, "Mikromechanik in der Elektronik", in Elektronik, vol. 37, #8, Jul. 1987, Munich, Germany, pp. 69-77.
P. Buchmann et al., "Smooth Angled Mirror Facet Fabrication", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 155-156.
P. Buchmann et al., "Vertically Emitting Diode Laser With Integrated Front.varies.Beam Monitor Photodiode", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 149-150.
G. T. Forrest, "Large Scale Laser Integration Arrives", Laser Focus World, Dec. 1989, p. 21.
Hayashi et al., Patent Abstracts of Japan, vol. 016, No. 074 (E-1170) & JP-A-32 65 117 (Mitsubishi Electric Corp.), Nov. 26, 1991.
J. Mohr et al., "Requirements on Resist Layers in Deep-Etch Synchrotron Radiation Lithography", J. Vac. Sci. Technol. B6(6), Nov.-Dec. 1988, pp. 2264-2267.
P. Mooney, "Photodiode Array for Monitoring Individual Lasers in a Laser Array", IBM Technical Disclosure Bulletin, vol. 27, No. 7B, Dec. 1984, pp. 4344-4345.
P. Vettiger et al., "Full-Water Technology--A New Approach to Large-Scale Water Fabrication and Integration", IEEE J. of Quantum Electronics, vol. 27, No. 6, Jun. 1991, pp. 1319-1331.
D. Webb et al., "Mirror Fabrication to Full-Water Laser Technology", Laser Diode Technology and Applications III, Jan. 23-25, 1991, SPIE Proceedings Series, vol. 1418, pp. 231-239.

Affiliated with

Also associated with

Rating

Integrated light deflector and method of fabrication therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Integrated light deflector and method of fabrication therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Integrated light deflector and method of fabrication therefor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1329074