Semiconductor memory device and method of manufacturing the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257309, 257296, H01L 27108, H01L 2976, H01L 2994

Patent

active

059863005

ABSTRACT:
A lower electrode of a capacitor is provided on a semiconductor substrate. The lower electrode includes an axis portion and a horizontal portion. An upper electrode of the capacitor is provided above the semiconductor substrate to cover the outer surface of the axis portion and the outer surface of the horizontal portion.

REFERENCES:
patent: 4673962 (1987-06-01), Chatterjee et al.
patent: 5023683 (1991-06-01), Yamada
patent: 5155057 (1992-10-01), Dennison et al.
patent: 5166090 (1992-11-01), Kim et al.
patent: 5223448 (1993-06-01), Su
patent: 5247196 (1993-09-01), Kimura
patent: 5284787 (1994-02-01), Ahn
patent: 5346844 (1994-09-01), Cho et al.
patent: 5532956 (1996-07-01), Watanabe
patent: 5629540 (1997-05-01), Roh et al.
patent: 5661065 (1997-08-01), Koga
Novel Stacked Capacitor Cell for 64Mb DRAM by Wakamiya et al., VL Sympo., 1989, pp. 69-70.
"3-Dimensional Stacked Capacitor Cell for 16M and 64M DRAMS" by ENA et al., 1988 IEEE, pp. 592-595.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor memory device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor memory device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor memory device and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1327900

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.