Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making
Patent
1996-06-17
1999-11-16
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
430 5, 430321, 355 45, 359360, 359361, 359584, 359838, 359884, G03F 900, G02B 508
Patent
active
059854910
ABSTRACT:
A photolithographic projection system for selectively irradiating a photosensitive layer on a wafer according to a predetermined pattern on a mask is discussed. The photolithographic projection system includes a radiation source which generates radiation such as light. A reflector reflects the radiation from the radiation source on a path which intersects the wafer. This reflector includes a radiation reflecting portion and a phase-shifting and partially reflecting portion adjacent the radiation reflecting portion. The reflecting portion may include a plurality of reflecting portions surrounded by the absorbing portion, or the reflecting portion may surround the absorbing portion. Alternately, the reflector may include a reflecting portion and an absorbing portion adjacent the reflecting portion. Related methods are also discussed.
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Kim Cheol-hong
Sohn Chang-jin
Codd Bernard
Samsung Electronics Co,. Ltd.
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