Photosensitive polymer composition containing photosensitive pol

Details Photosensitive polymer composition containing photosensitive pol Photosensitive polymer composition containing photosensitive pol

1996-12-19

1999-03-09

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302851, 4302831, 522 63, 522107, 522109, G03F 7028, G03F 7038, G03F 709

Patent

active

058798587

ABSTRACT:
A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a polymerizable monomer, a photocrosslinkable polyester and a photoinitiator. The photosensitive resins are present at a total weight ratio to the monomer of at least 1.5:1.

REFERENCES:
patent: 2732301 (1956-01-01), Robertson et al.
patent: 3030208 (1962-04-01), Scheilenberg
patent: 3622320 (1971-11-01), Allen
patent: 3702765 (1972-11-01), Laakso
patent: 3929489 (1975-12-01), Arcesi et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4062686 (1977-12-01), van Allan et al.
patent: 4239850 (1980-12-01), Kita et al.
patent: 4258123 (1981-03-01), Nagashima et al.
patent: 4414312 (1983-11-01), Goff et al.
patent: 4416973 (1983-11-01), Goff
patent: 4454220 (1984-06-01), Goff
patent: 4458007 (1984-07-01), Geissler
patent: 4481276 (1984-11-01), Ishkawa et al.
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 5045432 (1991-09-01), West et al.
patent: 5061600 (1991-10-01), West et al.
patent: 5085975 (1992-02-01), Mueller
patent: 5141842 (1992-08-01), Mitchell et al.
81-29756D, English Abstract of JP 56-22428 dated mar. 3, 1981 from WPIDS File, Derwent Information Ltd, 1998.

Affiliated with

Also associated with

Rating

Photosensitive polymer composition containing photosensitive pol does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive polymer composition containing photosensitive pol, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polymer composition containing photosensitive pol will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1319359