Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1995-12-06
1999-07-20
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
118715, C23C 1600
Patent
active
059251891
ABSTRACT:
The present invention recognizes that the build-up of residue in a metal alloy injection valve used to inject a liquid phosphorous precursor compound is due to the nickel in the alloy affecting the liquid phosphorous precursor compound. The invention thus provides components manufactured of an alloy having a low nickel content, preferably less than 5% nickel, and more preferably less than 1%. In an additional aspect of the invention, the alloy is provided with a higher chromium content, preferably at least 15% chromium, more preferably 16-27%.
REFERENCES:
patent: 5234724 (1993-08-01), Schmidt
patent: 5607002 (1997-03-01), Siegele
Lankford, The Making Shaping & Treating of Steel, 10th Ed U S Steel Corp, 1985.
Nguyen Chau
Sivaramakrishnan Visweswaren
Applied Materials Inc.
Bueker Richard
LandOfFree
Liquid phosphorous precursor delivery apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Liquid phosphorous precursor delivery apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Liquid phosphorous precursor delivery apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1318672