Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1990-05-07
1991-07-16
Simmons, David A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156656, B44C 122
Patent
active
050322214
ABSTRACT:
ITO is etched by a plasma containing CH.sub.3. gas.
REFERENCES:
patent: 4818326 (1989-04-01), Liu et al.
patent: 4878993 (1989-11-01), Rossi et al.
"A Novel Process for Reactive Ion Etching on InP, using CH.sub.4 /H.sub.2 ", by V. Niggebrugge, M. Klug and G. Garns, Inst. Phys. Conf. Ser. No. 79: Chapter 6, 1985.
Paz-Pujalt Gustavo R.
Roselle Paul L.
Wexler Ronald M.
Dang Thi
Eastman Kodak Company
Owens Raymond L.
Simmons David A.
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