Method of preparing photoresist material with undercoating of ph

Details Method of preparing photoresist material with undercoating of ph Method of preparing photoresist material with undercoating of ph

1985-03-06

1987-10-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430165, 430166, 430167, 430169, 430191, 430196, 430270, 430271, 430311, G03C 176, G03C 174

Patent

active

047029927

ABSTRACT:
The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

REFERENCES:
patent: 3402044 (1968-09-01), Steinhoff
patent: 3869292 (1975-03-01), Peters
patent: 4251619 (1981-02-01), Kurita
patent: 4268603 (1981-05-01), Sato
patent: 4287289 (1981-09-01), Sato
patent: 4334044 (1982-06-01), Kotani et al.
patent: 4370405 (1983-01-01), O'Toole et al.
patent: 4414314 (1983-11-01), Kaplan et al.
patent: 4536464 (1985-08-01), Nagashima et al.

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