Semiconductor process system and positioning method and apparatu

Details Semiconductor process system and positioning method and apparatu Semiconductor process system and positioning method and apparatu

1994-08-05

1996-10-15

Gordon, Paul P.

Boots, shoes, and leggings

36416701, G06F 1900

Patent

active

055660762

ABSTRACT:
A semiconductor wafer cleaning system includes a chemical cleaning section having a process vessel. A holder is arranged in the process vessel. The holder holds 50 wafers at once. Fifty grooves for receiving peripheral portions of wafers are formed on the holder. Fifty wafers are passed/received all together by a chuck having a pair of opening/closing arms to/from the holder. Fifty grooves for receiving peripheral portions of wafers are formed on each arm. A positioning apparatus is used to correct the offset of the relative position between the chuck and the holder from a reference relative position for transfer of wafers. The positioning apparatus has a detection unit which can be mounted on the chuck and has image pickup sections on two end portions. Each image pickup section simultaneously images a groove on the chuck and a corresponding groove on the holder. The resultant images of the two grooves are displayed within the same coordinate system on a monitor to be superposed on each other. The chuck and the holder are relatively moved to correct the offset between the images of the two grooves, thereby correcting the offset of the current relative position from the reference relative position.

REFERENCES:
patent: 5164905 (1992-11-01), Iwasaki et al.
patent: 5220935 (1993-06-01), Bailey et al.
patent: 5263504 (1993-11-01), Bailey et al.
patent: 5329732 (1994-07-01), Karlsrud et al.

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