Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-06-26
2000-08-29
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430920, G03F 7038
Patent
active
061106399
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
The present invention relates to a resist composition which is sensitive to an irradiation and a recording medium using the radiation-sensitive composition. More particularly, the invention relates to a negative-type resist composition which is sensitive to a high-energy radiation such as a KrF excimer laser, an X-ray or an electron beam. The resist composition according to the present invention is capable of exhibiting a high radiation sensitivity, a high resolution and an excellent process stability, and useful especially for the production of semiconductors, micron-order processing of optical masks or the like. Also, the recording medium according to the present invention is suitably applied to the production of semiconductors, printed circuit boards, integrated circuits, optical masks, liquid crystal devices, printing plates or the like.
BACKGROUND ART
In DE-B-3907953.8, DE-B-4112972.5, DE-B-4112968, DE-B-41129695 and U.S. Pat. No. 4,491,628, there have been disclosed radiation-sensitive mixtures which comprise a compound capable of generating an acid by the exposure to radiation, a water-insoluble but aqueous alkaline solution-soluble binder, and a compound which causes a cross-linking reaction (negative-type) or a decomposition reaction (positive-type) in the presence of an acid. These mixtures generate an acid upon exposure to radiation and, after the exposure, heat-treated to cause components thereof to be cross-linked with each other (negative-type) or decomposed (positive type) by catalytic effects of the acid generated to increase the difference in solubility to an aqueous alkaline solution between exposed and unexposed area thereof, thereby producing micro-patterns.
Although the conventional radiation-sensitive mixtures have a sensitivity and resolution sufficient to produce fine semiconductors, there arises a problem that the sensitivity and the definition thereof becomes deteriorated as the period between the exposure and a post-exposure baking step is prolonged. It is suggested that this problem is caused due to the fact that the acid generated by the exposure to radiation is diffused from the exposed area to the unexposed area, thereby rendering acid-latent images produced by the exposure unstable. In general, resist mixtures are required to be kept stable for the period between the exposure and the post-exposure baking step, e.g., for about two hours in the case of the production of semiconductors or for about twenty-four hours in the case of the production of optical masks.
DISCLOSURE OF THE INVENTION
The present invention has been made to eliminate the afore-mentioned problems encountered in the prior art.
In one aspect of the present invention, there is provided a radiation-sensitive composition comprising: radiation and represented by the formula (I): ##STR2## wherein X, Y and R.sup.1 to R.sup.5 have the following meanings: X and Y: independently a single bond, C.sub.1 -C.sub.8 alkylene, C.sub.1 -C.sub.4 alkene, --O--R.sup.11 --O-- (wherein R.sup.11 is an alkylene group having 1 to 4 carbon atoms), --NH--, --O--, --S--, --SO.sub.2 --, --CO--, --COO-- or --CONR.sup.12 -- (wherein R.sup.12 is a hydrogen atom, C.sub.1 -C.sub.18 alkyl, alkylaryl, halogenated alkyl, halogenated aryl, a halogen atom, alkoxy, phenoxy, alkylsulfonyl-oxy, halogenated alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy); hetero-aryl, a halogen atom, alkyl-substituted or aryl-substituted amino, alkyl-substituted or aryl-substituted amido, nitro, cyano, aldehyde, acetal, alkoxy, phenoxy, alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy; aryl, halogenated hetero-aryl, alkylsulfonyl-oxy, halogenated alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy; presence of the acid to cause the binder to be cross-linked.
In addition, in another aspect of the present invention, there is provided a radiation-sensitive recording medium comprising a substrate, and a coating layer formed on the substrate and made of the above-mentioned radiation-sensitive co
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Funato Satoru
Kawasaki Natsumi
Masuda Seiya
Ashton Rosemary
Baxter Janet
Hoechst Japan Limited
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