Aqueous developable deep UV negative resist containing benzannel

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430271, 430275, 430277, 430278, 522 52, 522 63, 522 68, 522166, G03C 1492, C08J 328

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active

051789876

ABSTRACT:
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:

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Chemical Abstract 106(10):76147f, Onishi et al., Photosensitive Compositions Jul. 12, 1991.
Chemical Abstract No. 108(7) 55225f, by McAuley, Iain; Krogh, Erik; and Wan, Peter from the Journal of American Chemical Society, 110(2), 600-2.
Abstract No. 77(14):92787c by Takacs, Mihaly; Kertesz, Piroska; Vegh, Antal; and Simonyi, Istvan from the Acta Pharmaceutical of Hungari, 42(4), 177-82.

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