Resist composition

Details Resist composition Resist composition

1994-12-07

1996-12-24

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430910, 522149, G03C 173

Patent

active

055872743

ABSTRACT:
Disclosed is a positive type resist composition which can form a good pattern by subjecting a resist layer to plural exposures and developments, which results in excellent adhesion between the resist layer and a substrate. The composition comprises:
(a) a polymer having an acid value of 2 to 200, prepared from 20 to 94% by weight of a t-butyl ester of a .alpha.,.beta.-ethylenically unsaturated carboxylic acid, 5 to 79% by weight of a (meth)acrylate of the formula:

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5045431 (1991-09-01), Allen et al.
patent: 5077174 (1991-12-01), Bauer et al.
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5356979 (1994-10-01), Tai et al.
Japanese Abstract of 58-118641 published Jul. 14, 1983.
Japanese Abstract of 57-8541 published Jan. 16, 1982.

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