Promotion of the adhesion of fluorocarbon films

Details Promotion of the adhesion of fluorocarbon films Promotion of the adhesion of fluorocarbon films

1995-11-15

1998-08-04

Powell, William

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

1562726, 216 34, 216 67, B44C 122

Patent

active

057888701

ABSTRACT:
The adhesion between a polymeric fluorocarbon film and a substrate is improved by providing a non-volatile carbide-forming metallic layer intermediate the substrate and the polymeric fluorocarbon film, and exposing the substrate to ion-bombardment in a noble gas/polymerizing gas atmosphere prior to providing the fluorocarbon films.

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Chapman, Brian "Glow Discharge Processes", (John Wiley and Sons), NY 1980 pp. 278-283.
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D.W. Rice, et al., "Glow Discharge Polymerization of Tetrafluoroethylene, 1,1, difluoroethylene, and chlorotrifluoroethylene," J. Electrochem. Soc., Sep. 1976, pp. 1308-1312.
Anderson, et al., "Electron Donor-Acceptor Properties of Thin Polymer Films on Silicon. II. Tetrafluroethylene Polymerized by RF Flow Discharge Techniques," Journal of Polymer Science, vol. 879-895 (1976).

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