Method for making stained glass photomasks using stabilized glas

Details Method for making stained glass photomasks using stabilized glas Method for making stained glass photomasks using stabilized glas

1980-01-10

1981-08-25

Smith, Ronald H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

427 12, 427287, 427314, 427380, 427399, B05D 314, B05D 302

Patent

active

042860520

ABSTRACT:
Accuracy of producing stained glass photomasks is improved by means of a preliminary heat treatment to adjust the fictive temperature of the glass, thereby improving dimensional stability during subsequent production of a stained pattern in the glass.

REFERENCES:
patent: 2927042 (1960-03-01), Hall et al.
patent: 3561963 (1971-02-01), Kiba
patent: 3573948 (1971-04-01), Tarnopol
patent: 3620795 (1971-11-01), Kiba
patent: 3732792 (1973-05-01), Tarnopol
patent: 4144066 (1979-03-01), Ernsberger
patent: 4192666 (1980-03-01), Lupoi
patent: 4197105 (1980-04-01), Hummel et al.
Kingery et al., "Introduction to Ceramics", 2nd Ed., 1960, pp. 599-603.
Scholes, "Modern Glass Practice", 7th Ed., 1975, pp. 384 and 385.
Shand, "Glass Engineering Handbook", 2nd Ed., 1958, pp. 11 and 12.
Tool, "Relation Between Inelastic Deformability and Thermal Expansion of Glass in its Annealing Range", J. Am. Cer. Soc., vol. 29, No. 9, 1946, pp. 240-253.

Affiliated with

Also associated with

Rating

Method for making stained glass photomasks using stabilized glas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for making stained glass photomasks using stabilized glas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for making stained glass photomasks using stabilized glas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1159236