Photosensitive film usable in microgravure

Details Photosensitive film usable in microgravure Photosensitive film usable in microgravure

1979-05-11

1980-11-25

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415922, 430271, 430311, 430313, 430321, 428411, G03C 168, G03C 500

Patent

active

042359589

ABSTRACT:
Photosensitive film which can be used in microgravure, wherein it comprises at least one organic monomolecular layer having amphiphilic molecules with at least one irradiation polymerizable function and one aliphatic chain with at least 12 carbon atoms, a polymerizable function being located at the hydrophobic end of said molecules.
The photosensitive films can be used with particular advantage in the production of microetched objects, such as optical and holographic systems, integrated optical devices and electronic microcircuits.

REFERENCES:
patent: 3923761 (1975-12-01), Parker et al.
Stenhagen, Arkiv for Keni, vol. 1, No. 13, 99-104 (1949).
Avikan et al., IBM Technical Disclosure Bullentin, vol. 14, No. 1, Jun. 1971.
Whitts Microcircut engineering 1979, (Sep. 1979), Aachen Communication II p. 21.
Gaines, Interscience, 1966 Chap. 4, Sect. IV-B pp. 180, 163 and 331.
Adam, The Physics and Chemistry of Surfaces (Dover Publications) 1968, p. 74.
Wunderlick, Molecular Physics, Academic Press (1973), p. 254.

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