Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1988-10-26
1990-06-26
Schor, Kenneth M.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156652, 1566591, 1566611, H01L 21308
Patent
active
049369512
ABSTRACT:
A fine pattern forming method capable of forming an accurate fine pattern without charge-up at the time of electron beam or focus ion beam exposure is provided by treating the bottom layer or intermediate layer or silicon containing resist of a multi-layer resist with ion shower irradiation or reducing solvent.
REFERENCES:
patent: 4068018 (1975-09-01), Hashimoto
patent: 4222792 (1979-09-01), Lever
patent: 4311785 (1982-01-01), Ahne et al.
patent: 4366230 (1982-12-01), Ahne et al.
patent: 4465768 (1984-08-01), Ueno et al.
patent: 4504646 (1985-03-01), Nate et al.
patent: 4521274 (1984-05-01), Reichmanis
patent: 4556619 (1985-12-01), Ogata et al.
patent: 4615782 (1985-06-01), Namatsu
patent: 4649099 (1985-07-01), Oguchi
patent: 4702993 (1985-11-01), White
patent: 4764247 (1987-03-01), Leveriza
Hashimoto Kazuhiko
Kawakita Kenji
Koizumi Taichi
Nomura Noboru
Bruckner John J.
Matsushita Electric - Industrial Co., Ltd.
Schor Kenneth M.
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