Negative photoresist composition

Details Negative photoresist composition Negative photoresist composition

1997-06-18

1999-02-02

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302701, 430325, 430920, G03C 500

Patent

active

058662995

ABSTRACT:
A photoresist composition and process that minimizes the effect of photogenerated acid migration. The photoresist comprises an alkali soluble resin, a photoacid generating compound that undergoes photolysis within a wavelength of from 330 to 700 nm to yield a strong acid, a crosslinking agent capable of crosslinking the composition when activated by photogenerated hydrohalide acid and a buffer comprising a mixture of an organic carboxylic acid and a strong base having a pK.sub.b of 5 or less present in a concentration sufficient to immobilize from 0.1 to 25 mole percent of photogenerated acid. The buffer is responsible for immobilization of the acid.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987307 (1976-10-01), Giconi
patent: 4189323 (1980-02-01), Buhr
patent: 5128232 (1992-07-01), Thackeray et al.
patent: 5525453 (1996-06-01), Przybilla et al.
patent: 5609989 (1997-03-01), Bantu et al.
patent: 5663035 (1997-09-01), Masuda et al.
patent: 5733705 (1998-03-01), Bantu et al.

Affiliated with

Also associated with

Rating

Negative photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Negative photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Negative photoresist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1115762