Method of forming patterns

Details Method of forming patterns Method of forming patterns

1984-06-27

1986-01-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156653, 156656, 156657, 1566591, 156667, 156668, 204192E, 430313, 430317, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

045632413

ABSTRACT:
After a bottom layer film, an intermediate film and a top layer film were laminated and formed on a film which is processed and which was formed on a substrate having a different level portion, the patterns of the top layer film are sequentially transferred to the intermediate film, bottom layer film and film to be processed, thereby forming the patterns of the film to be processed. By minimizing the differences among the light refractive index of the intermediate film and the light refractive indexes of the bottom and top layer films, the patterns can be formed with a far higher degree of accuracy than that by the conventional multi layer resist method.

REFERENCES:
patent: 4343677 (1982-08-01), Kinsbron et al.
patent: 4362597 (1982-12-01), Fraser et al.
patent: 4454221 (1984-06-01), Chen et al.

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