Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of...
Patent
1996-10-02
2000-01-04
Bowers, Charles
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
438 3, 438240, 438758, 438754, 427226, 427 96, B05D 308
Patent
active
060109696
ABSTRACT:
A method of forming a film on a substrate using chemical vapor deposition techniques and carboxylate complexes. The complexes and method are particularly suitable for the preparation of semiconductor structures.
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Bowers Charles
Micro)n Technology, Inc.
Nguyen Thanh
LandOfFree
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