Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-08-18
2000-09-19
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302861, 4302881, G03F 7004
Patent
active
061209724
ABSTRACT:
A radiation-sensitive resin composition comprising (A) a copolymer which comprises (a) a repeating unit (I) formed by cleavage of a carbon--carbon double bond of a monomer having one polymerizable carbon--carbon double bond and (b) a repeating unit (II) formed by cleavage of a carbon--carbon double bond of a monomer having two or more polymerizable carbon--carbon double bonds and at least one divalent group decomposed by an acid of the following formulas (1) or (2), ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are an alkyl group having 1-5 carbon atoms or an aryl group having 6-14 carbon atoms individually, said monomer having a structure in which each carbon--carbon double bond combines via said divalent group, and (B) a photoacid generator. The radiation-sensitive resin composition exhibits excellent sensitivity and resolution, fewer effect from the swing curves, excellent pattern profile, and superior heat resistance, high sensitivity to ultraviolet rays, far ultraviolet rays, X-rays, and various types of radiation such as charged particle rays, and is useful as a chemically amplified positive tone resist used in the manufacture of integrated circuit devices.
REFERENCES:
M-Y. Li, et al., Journal of Imaging Science, vol. 34, No. 6, pp. 259-264, "Imaging by Photodecoupling of Crosslinks in Polymer Gels", Nov./Dec. 1990.
March, Jerry, Advanced Organic Chemistry 4th ed., John Wiley & Sons, NY, 1992, p. 392.
Iwanaga Shin-ichiro
Kawaguchi Kazuo
Kobayashi Eiichi
Tanabe Takayoshi
Ashton Rosemary
Baxter Janet
JSR Corporation
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