Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1998-05-19
2000-01-04
Meeks, Timothy
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427579, 427162, 427166, 42725531, 427255394, 4272557, C23C 1634
Patent
active
060107561
ABSTRACT:
The invention is a method of depositing a rugate filter coating on a substrate, with the coating having an index of refraction that varies with the depth thereof. In detail, the method comprising the steps of: a) placing the substrate in an apparatus capable of depositing the coating by a plasma-enhanced chemical vapor deposition process, the apparatus having the capacity to deposit a coating from a mixture of at least two gases and means to control the mixture of gases as a function of time; b) calculating the required refractive index profile wherein the index of refraction is a function of depth thereof using the filter parameters; c) calculating the required total depth of the coating; d) dividing the total depth of the filter into a series of increments having a specific length; e) calculating the index of refraction for each of the series of increments; f) calculating the specific mixture of the at least two gases required to provide the index of refraction for each of the series of increments and the length of time required to deposit the required thickness of each increment; and g) depositing the coating on the substrate by providing the specific mixture of the at least two gases for the specific time such that the series of increments of the coating is deposited on the substrate. The nugate filter consists of a transparent coating on a substrate having an incrementally varying refractive index profile along its width, with the width of the increment between 5 and 30 angstroms.
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Lockheed Martin Corporation
Meeks Timothy
Schruhl Robert A.
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