Removable liner design for plasma immersion ion implantation

Details Removable liner design for plasma immersion ion implantation Removable liner design for plasma immersion ion implantation

1998-12-18

2000-09-19

Diamond, Alan

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429802, 20429804, 20429805, 20429826, 20429811, 118728, 118733, 118723I, 118723MP, C23C 1600, C23C 16458, C23C 1450, C23C 1434

Patent

active

061206601

ABSTRACT:
A plasma treatment system (200) for implantation with a novel susceptor with a silicon coating (203). The system (200) has a variety of elements such as a chamber, which can have a silicon coating formed thereon, in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate. The silicon coating reduces non-silicon impurities that may attach to the silicon substrate. The system (200) also includes a silicon liner, which is used to line inner portions of the chamber walls.

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