Positive-working photosensitive composition

Details Positive-working photosensitive composition Positive-working photosensitive composition

1999-03-17

2000-05-09

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430914, 430921, 430925, G03C 173, G03C 172

Patent

active

060602139

ABSTRACT:
The present invention provides a positive-working photosensitive composition which comprises (a) a basic nitrogen-containing compound having a polycyclic structure represented by formula (I) and (b) at least one of compounds represented by formulae (II) to (IV) defined in the specification: wherein Y and Z may be the same or different and each represent a straight-chain, branched or cyclic alkylene group, which may contain a hetero atom or may be substituted. The positive-working photosensitive composition which exhibits no reduction of width of resist pattern or no T-top deformation of surface shape of resist pattern with time between after exposure and heat treatment without causing sensitivity drop.

REFERENCES:
Umehara et al. 116 : 245290, File HCA of STN Database Service, Chemical Abstracts, American Chemical Society, 1992. pp. 19-21 (English Abstract of DE 4124426).

Affiliated with

Also associated with

Rating

Positive-working photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive-working photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive-working photosensitive composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1063357