Semiconductor device and process of producing same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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Details

257296, H01L 27108, H01L 2976, H01L 2994, H01L 31119

Patent

active

055503950

ABSTRACT:
A semiconductor device includes a semiconductor substrate having a memory cell area and a circuit area surrounding the memory cell area with a boundary area interposed therebetween. A first conductive layer covers the memory cell area and extends onto the boundary area. A first insulating layer covers the surrounding circuit area and part of the extended portion of the first conductive layer. A second insulating layer covers the first insulating layer and the first conductive layer. A throughhole is formed through the first and second insulating layers. A second conductive layer is electrically connected with another conductive layer via the throughhole and extends from the memory cell area to the surrounding circuit area. The process of producing the semiconductor device is also disclosed.

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patent: 5091761 (1992-02-01), Hiraiwa et al.
patent: 5126810 (1992-06-01), Gotou
patent: 5153685 (1992-10-01), Murata et al.
patent: 5196910 (1993-03-01), Moriuchi et al.
patent: 5237187 (1993-08-01), Suwanai et al.
patent: 5245205 (1993-09-01), Higasitani et al.

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