Photosensitive material for screen processing

Details Photosensitive material for screen processing Photosensitive material for screen processing

1992-05-20

1993-09-21

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430271, 430308, G03C 1492

Patent

active

052468151

ABSTRACT:
A photosensitive material for screen processing comprising a photosensitive resin composition (A) applied to a plastic film, and including a water-soluble or water-dispersible polymer or copolymer, an unsaturated compound, and a photopolymerization initiator, and a photosensitive resin composition (B) applied in a thickness of at least 0.1 .mu.m to the coated composition (A) and including a film-forming polymeric compound; and a photo-crosslinking polyvinyl alcohol partially containing photo-cross-linkable units provides a coating film which is water-developable, highly sensitive, and excellent in water and solvent resistances.

REFERENCES:
patent: 4339524 (1982-07-01), Ichimura et al.
patent: 4478977 (1984-10-01), Sperry et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4920030 (1990-04-01), Ichimura et al.

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