Magnetron cathode for sputtering ferromagnetic targets

Details Magnetron cathode for sputtering ferromagnetic targets Magnetron cathode for sputtering ferromagnetic targets

1984-12-05

1986-02-25

Tufariello, T. M.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1434

Patent

active

045727767

ABSTRACT:
A magnetron cathode for sputtering ferromagnetic targets. The magnet system consists of magnet poles of opposite polarity lying one within the other disposed on a basic cathode body. Between the target and the pole shoes, which consist of target material, two circumferential air gaps in the direction of the depth of the system are formed. The surfaces of projection of the magnet poles and target do not overlap. For the purpose of making the target ablation uniform while simultaneously achieving high sputtering rates, the pole shoes are separated, in accordance with the invention, each by a distance S from the magnet poles. The magnet poles lie in an area which runs from a plane passing through the sputtering surface in the direction of the depth of the system. Between the pole shoes and the target, on the one hand, and the magnet poles on the other, there is disposed a thermally conductive metal body which is in communication with at least one coolant passage and consists of a nonferromagnetic material.

REFERENCES:
patent: 4198283 (1980-04-01), Class
patent: 4299678 (1981-11-01), Meckel

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