Dry film, aqueous processable photoresist compositions

Details Dry film, aqueous processable photoresist compositions Dry film, aqueous processable photoresist compositions

1991-02-13

1991-09-03

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430910, 522 15, 522 30, G03C 176

Patent

active

050454315

ABSTRACT:
A new polymer family is shown for use in high speed photoresists. A dry film photoresist includes a polymer binder prepared from t-butyl methacrylate/methylmethacrylate/acrylic acid/ethyl acrylate and a suitable initiator.

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