Magnetron method and apparatus for producing high density ionic

Details Magnetron method and apparatus for producing high density ionic Magnetron method and apparatus for producing high density ionic

1990-05-21

1991-09-03

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429806, 20429816, 20429837, 20429838, 118723, 156345, 156643, B01J 1912, H01H 146, C23F 404, C23C 1435

Patent

active

050451669

ABSTRACT:
A method and apparatus for magnetron gas discharge processing of substrates using a remote plasma source provides a uniform magnetic field (B) created across the surface of a substrate in an evacuable chamber. An electric field (E) is created perpendicular to the substrate by an electrically powered cathode located beneath the substrate. The magnetic and electric fields interact with the plasma to create an E.times.B electron drift region adjacent to the surface of a substrate. A remote plasma source is provided and oriented so that the plasma stream from the remote source is coupled to the E.times.B region adjacent to the substrate surface parallel to the magnetic field with minimal movement of the plasma stream perpendicular to the magnetic field to thereby provide a high density plasma stream into the E.times.B drift region.

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