ZnO-based semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Semiconductor is an oxide of a metal or copper sulfide

Reexamination Certificate

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C257SE29094

Reexamination Certificate

active

07741637

ABSTRACT:
Provided is a ZnO-based semiconductor device capable of growing a flat ZnO-based semiconductor layer on an MgZnO substrate having a main surface on the lamination side oriented in a c-axis direction. ZnO-based semiconductor layers2to6are epitaxially grown on an MgxZn1-xO (0≦x<1) substrate1having a +C surface (0001), as a main surface, inclined at least in an m-axis direction. A p-electrode8is formed on the ZnO-based semiconductor layer5, and an n-electrode9is formed on the underside of the MgxZn1-xO substrate1. Thereby, steps regularly arranged in the m-axis direction can be formed on the surface of the MgxZn1-xO substrate1, and a phenomenon called step bunching is prevented. Consequently, the flatness of a film of the semiconductor layers laminated on the substrate1can be improved.

REFERENCES:
patent: 6674098 (2004-01-01), Niki et al.
patent: 2004/0227150 (2004-11-01), Nakahara
patent: 2005/0208687 (2005-09-01), Kasai et al.
patent: 2005/0242357 (2005-11-01), Uematsu et al.
patent: 2004-235794 (2004-08-01), None
patent: 2004-304166 (2004-10-01), None
patent: 2005-298319 (2005-10-01), None
patent: 2005-340765 (2005-12-01), None
Atsushi Tsukazaki et al.: “Repeated temperature modulation epitaxy for p-type doping and light-emitting diode based on ZnO,” Nature Materials, Published online (www.nature.com
aturematerials): Dec. 19, 2004, pp. 1-5.
K. Nakahara et al.: “Growth of N-doped and Ga+N-codoped ZnO films by radical source molecular beam epitaxy,” Journal of Crystal Growth 237-239 (2002), pp. 503-508.

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