Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2007-10-29
2010-10-12
Lee, Hwa S. A (Department: 2886)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
Reexamination Certificate
active
07812943
ABSTRACT:
A method of imaging critical dimensions by measuring the zeroeth order of diffracted light. The method involves providing a target, directing light onto the target so as to cause the target to diffract the light. The zeroeth order of the diffracted light is collected and analyzed to determine structural features of the target. The target can be an article of manufacture, such as a semiconductor device, or a separate target that is provided or fabricated on an article of manufacture. One of at least the wavelength and the angle at which the light is directed onto the target can be scanned. The target can fill all or only a portion of the field of view.
REFERENCES:
patent: 7576911 (2009-08-01), Larimer
patent: 2002/0101585 (2002-08-01), Benesch et al.
Attota Ravikiran
Larrabee Robert
Silver Richard M.
A Lee Hwa S.
Butzel Long
The National Institute of Standards and Technology
The United States of America as represented by the Secretary of
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