Zero undercut etch process

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430313, 430318, 430394, 1566591, 1566611, G03C 500

Patent

active

052945200

ABSTRACT:
A process in the fabrication of wiring patterns on ceramic or polymeric substrates precisely controls the cross-sectional dimensions of the metallization that constitute the wiring patterns. A single etch process defines thin film conductors on a substrate without loss to the conductor cross-section and provides enhanced thin film design flexibility. The zero undercut etch process uses photoresists defining the metal patterns to completely protect the metal patterns during the subetch.

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patent: 4591547 (1986-05-01), Brownell
patent: 4654295 (1987-03-01), Yang et al.
patent: 4687730 (1987-08-01), Eron
patent: 4702792 (1987-10-01), Chow et al.

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