Z-pinch soft x-ray source using diluent gas

X-ray or gamma ray systems or devices – Source

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

378127, G21G 400

Patent

active

060758384

ABSTRACT:
A plasma x-ray source includes a chamber defining a pinch region having a central axis, a gas supply for introducing a gas mixture into the pinch region, a preionizing device disposed around the pinch region for preionizing the gas mixture in the pinch region, and a pinch anode and a pinch cathode disposed at opposite ends of the pinch region. The gas mixture includes a primary X-radiating gas, such as xenon, and a low atomic number diluent gas, such as helium. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to application of a high energy electrical pulse to the pinch anode and the pinch cathode. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate X-rays. The gas mixture provides enhanced radiation intensity and reduced cost for the primary X-radiating gas.

REFERENCES:
patent: 3968378 (1976-07-01), Roberts et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5577092 (1996-11-01), Kublak et al.
patent: 5637962 (1997-06-01), Prono et al.
McGeoch, M., "Radio-frequency-preionized xenon Z-pinch source for extreme ultraviolet lithography". Applied Optics, vol. 37, No. 9, Mar. 20, 1998, pp. 1651-1658.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Z-pinch soft x-ray source using diluent gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Z-pinch soft x-ray source using diluent gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Z-pinch soft x-ray source using diluent gas will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2075715

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.