X-ray or gamma ray systems or devices – Source
Patent
1998-03-18
2000-06-13
Porta, David P.
X-ray or gamma ray systems or devices
Source
378127, G21G 400
Patent
active
060758384
ABSTRACT:
A plasma x-ray source includes a chamber defining a pinch region having a central axis, a gas supply for introducing a gas mixture into the pinch region, a preionizing device disposed around the pinch region for preionizing the gas mixture in the pinch region, and a pinch anode and a pinch cathode disposed at opposite ends of the pinch region. The gas mixture includes a primary X-radiating gas, such as xenon, and a low atomic number diluent gas, such as helium. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to application of a high energy electrical pulse to the pinch anode and the pinch cathode. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate X-rays. The gas mixture provides enhanced radiation intensity and reduced cost for the primary X-radiating gas.
REFERENCES:
patent: 3968378 (1976-07-01), Roberts et al.
patent: 5504795 (1996-04-01), McGeoch
patent: 5577092 (1996-11-01), Kublak et al.
patent: 5637962 (1997-06-01), Prono et al.
McGeoch, M., "Radio-frequency-preionized xenon Z-pinch source for extreme ultraviolet lithography". Applied Optics, vol. 37, No. 9, Mar. 20, 1998, pp. 1651-1658.
PLEX LLC
Porta David P.
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