Yield and line width performance for liquid polymers and...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S311000, C430S319000, C430S322000, C510S175000

Reexamination Certificate

active

10664095

ABSTRACT:
Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.

REFERENCES:
patent: 2295522 (1942-09-01), Shorter
patent: 2501724 (1950-03-01), Hughey
patent: 2501725 (1950-03-01), Hughey
patent: 3204682 (1965-09-01), Teleshefsky et al.
patent: 3516607 (1970-06-01), Shelor
patent: 4326553 (1982-04-01), Hall
patent: 4457259 (1984-07-01), Samuels
patent: 4507333 (1985-03-01), Baise et al.
patent: 4564280 (1986-01-01), Fukuda
patent: 4721252 (1988-01-01), Colton
patent: 4747541 (1988-05-01), Morine et al.
patent: 4872417 (1989-10-01), Kuwahara et al.
patent: 4938994 (1990-07-01), Choinski
patent: 5094884 (1992-03-01), Hillman et al.
patent: 5094934 (1992-03-01), Lazarus et al.
patent: 5127984 (1992-07-01), Hua et al.
patent: 5252137 (1993-10-01), Tateyama et al.
patent: 5342738 (1994-08-01), Ikeda
patent: 5374312 (1994-12-01), Hasebe et al.
patent: 5429912 (1995-07-01), Neoh
patent: 5449405 (1995-09-01), Cardinali et al.
patent: 5489623 (1996-02-01), Babb et al.
patent: 5625433 (1997-04-01), Inada et al.
patent: 5643363 (1997-07-01), Hosogaya et al.
patent: 5658615 (1997-08-01), Hasebe et al.
patent: 5678116 (1997-10-01), Sugimoto et al.
patent: 5685934 (1997-11-01), Ikeda et al.
patent: 5720814 (1998-02-01), Takagi et al.
patent: 5769946 (1998-06-01), Kutsuzawa et al.
patent: 5772764 (1998-06-01), Akimoto
patent: 5782978 (1998-07-01), Kinose et al.
patent: 5788773 (1998-08-01), Okuda et al.
patent: 5814151 (1998-09-01), Lee et al.
patent: 5815762 (1998-09-01), Sakai et al.
patent: 5820677 (1998-10-01), Yonaha
patent: 5824155 (1998-10-01), Ha et al.
patent: 5853961 (1998-12-01), Sakai et al.
patent: 5854953 (1998-12-01), Semba
patent: 5885755 (1999-03-01), Nakagawa et al.
patent: 5897982 (1999-04-01), Shibata et al.
patent: 5902399 (1999-05-01), Courtenay
patent: 5919520 (1999-07-01), Tateyama et al.
patent: 5939139 (1999-08-01), Fujimoto
patent: 6012858 (2000-01-01), Konishi et al.
patent: 6013317 (2000-01-01), Motoda et al.
patent: 6019843 (2000-02-01), Park et al.
patent: 6033475 (2000-03-01), Hasebe et al.
patent: 6056998 (2000-05-01), Fujimoto
patent: 6062240 (2000-05-01), Sada et al.
patent: 6063190 (2000-05-01), Hasebe et al.
patent: 6159662 (2000-12-01), Chen et al.
patent: 6248171 (2001-06-01), Gurer et al.
patent: 6384894 (2002-05-01), Matsuyama et al.
patent: 6669779 (2003-12-01), Gurer et al.
patent: 6689215 (2004-02-01), Nguyen
patent: 6746826 (2004-06-01), Park et al.
patent: 0110558 (1984-06-01), None
patent: 0794463 (1997-09-01), None
patent: 0829767 (1998-03-01), None
patent: 57198457 (1982-12-01), None
patent: 58088749 (1983-06-01), None
patent: 58111318 (1983-07-01), None
patent: 59007949 (1984-01-01), None
patent: 59050440 (1984-03-01), None
patent: A 04-124812 (1992-04-01), None
patent: A 05-055133 (1993-03-01), None
patent: 06045244 (1994-02-01), None
patent: 07282476 (1995-10-01), None
patent: 08142534 (1996-06-01), None
patent: 08272083 (1996-10-01), None
patent: 11307433 (1998-04-01), None
patent: WO 99/53381 (1999-10-01), None
patent: WO 00/16163 (2000-03-01), None
International Search Report PCT/US99/20115.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Yield and line width performance for liquid polymers and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Yield and line width performance for liquid polymers and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Yield and line width performance for liquid polymers and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3868255

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.