Xenon ion beam to improve track width definition

Details Xenon ion beam to improve track width definition Xenon ion beam to improve track width definition

2008-01-22

2008-01-22

Tugbang, A. Dexter (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603120, C029S603130, C029S603140, C029S603180, C360S324000, C360S324110, C216S022000, C216S066000, C204S192340

Reexamination Certificate

active

10827950

ABSTRACT:
Using a beam of xenon ions together with a suitable mask, a GMR stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal, having sidewalls comprising a vertical section that includes all of the free layer, has been formed. This is followed by formation of the longitudinal bias and conductive lead layers in the usual way. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.

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patent: 59-33830 (1984-02-01), None
Matsuo et al., “Sub-Micron GMR Sensors with Vertically Integrated Hard Magnet Biasing Applicable for High Temperature Operation”, IEEE Transactions on Magnetics, vol. 37, No. 4, Jul. 2001, pp. 2001-2003.

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