Xenon enhanced plasma etch

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156646, 156662, 156668, 20419237, C03C 1500

Patent

active

047863595

ABSTRACT:
A plasma etch process and apparatus is disclosed in which a gas mixture comprises CF.sub.3 Br, xenon or krypton, and oxygen. The plasma reactor includes a sacrificial element, preferably in the form of a graphite ring, on the lower electrode of a parallel plate reactor.

REFERENCES:
patent: 4375385 (1983-03-01), Hanlon
patent: 4468285 (1984-08-01), Bayman et al.
patent: 4547260 (1985-10-01), Takada et al.
patent: 4582581 (1986-04-01), Flanigan et al.
patent: 4592801 (1986-06-01), Hara et al.
patent: 4615764 (1986-10-01), Bobbio et al.

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