X-Y Stage for a patterned wafer automatic inspection system

Details X-Y Stage for a patterned wafer automatic inspection system X-Y Stage for a patterned wafer automatic inspection system

1984-02-22

1985-12-03

Kittle, John E.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356 73, 356239, G01B 1100

Patent

active

045563179

ABSTRACT:
An automatic patterned wafer inspection system includes macro and micro inspection stations having optical axes that are 10 inches apart on an X-Y crossed roller stage which provides 7 inches of travel in each of two directions along two orthogonal axes. A macro-micro transport arm is pivotally interconnected with the stage and supports a turntable with a vacuum chuck centrally located thereon. The transport arm is positioned to move the wafer from a position 5 inches to the left of center of the stage (the macro axis) to a position 5 inches to the right of the center of the stage (the micro axis). Repeatability of positioning of the arms is obtained by using a spring-loaded link to drive the transport arm against a hard stop located at the left and right of the stage. The turntable is mounted so as to have an outside edge adjacent the distal end of the transport arm. A vacuum chuck for holding the wafer is attached to the turntable. A belt and pulley drive is used to rotate the turntable when it is necessary for the wafer alignment.

REFERENCES:
patent: 4185298 (1980-01-01), Billet et al.
patent: 4240750 (1980-12-01), Kurtz et al.
patent: 4448532 (1984-05-01), Joseph et al.

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