X-ray transmitting membrane for mask in x-ray lithography and me

Stock material or miscellaneous articles – Composite – Of inorganic material

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428 45, 428157, 428446, 428704, 430 5, 427160, 427250, 4272551, 4273722, 378 35, B32B 900, G03F 900

Patent

active

053266498

ABSTRACT:
Disclosed is an X-ray transmitting frame-supported membrane of silicon nitride suitable as a mask blank of an X-ray lithographic mask having outstandingly high resistance against irradiation with high-energy radiations and high transmission of light of a wavelength of 633 nm. These very desirable properties are obtained as a consequence of the extremely low content, i.e. 1.0 atomic % or less, of hydrogen in the silicon nitride, which can be achieved as a result of the specific preparation procedure by the CVD method in which the reactant gases are silane or disilane and ammonia in a specified mixing ratio to be reacted under a specified pressure and at a specified temperature.

REFERENCES:
patent: 5066533 (1991-11-01), America et al.

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