X-ray system and X-ray exposure apparatus

Details X-ray system and X-ray exposure apparatus X-ray system and X-ray exposure apparatus

1998-03-26

1999-12-28

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378160, G21K 500

Patent

active

060091444

ABSTRACT:
An X-ray system includes a radiation source for producing a radiation beam containing X-rays, a mirror device for reflecting X-rays, a beam duct for introducing the X-rays reflected by the mirror device, to an irradiation zone where an object to be irradiated can be exposed, and a shutter capable of blocking the radiation beam. A protection wall is disposed downstream of the mirror device with respect to the radiation source, for blocking the radiation beam. When the protection wall has a thickness t, the beam duct passing through the protection wall has an opening size a, and the beam duct has a tilt angle .theta., there is a relation (t-t.sub.0) sin .theta..gtoreq.a, where t.sub.0 is a minimum thickness of the protection wall required to substantially block the radiation beam from a radiation source.

REFERENCES:
patent: 5001734 (1991-03-01), Uda et al.
patent: 5285488 (1994-02-01), Watanabe et al.
patent: 5448612 (1995-09-01), Kasumi et al.
patent: 5581590 (1996-12-01), Mori et al.
patent: 5623529 (1997-04-01), Ebinuma et al.

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