X-ray source comprising double-angle conical target

Details X-ray source comprising double-angle conical target X-ray source comprising double-angle conical target

1984-09-07

1986-10-21

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378141, 378143, H01J 3508

Patent

active

046189726

ABSTRACT:
An improved X-ray source for a lithographic system comprises a double-angle conical target. The target is characterized by a small apparent source diameter and an efficient cooling system. Submicron resolution and high-power operation are thereby made feasible.

REFERENCES:
patent: 4159437 (1979-06-01), Sahores
patent: 4238682 (1980-12-01), Vratny
patent: 4258262 (1981-03-01), Maldonado
patent: 4439870 (1984-03-01), Poulsen et al.
patent: 4455504 (1984-06-01), Iversen
patent: 4477921 (1984-10-01), Armini
patent: 4521903 (1985-06-01), Braun
Technical Digest, IEDM, 1980, "Scaling the Micron Barrier with X-rays", by M. P. Lepselter, p. 42.
Journal Vacuum Science Technology, vol. 16, 1979, "X-ray Lithography Source Using a Stationary Solid Pd Target", by J. R. Maldonado et al., p. 1942.

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