X-ray scattering with a polychromatic source

Details X-ray scattering with a polychromatic source X-ray scattering with a polychromatic source

2006-04-25

2006-04-25

Bruce, David V. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S089000

Reexamination Certificate

active

07035375

ABSTRACT:
A method for inspection of a sample includes irradiating the sample with a polychromatic beam of X-rays, comprising X-ray photons having a range of respective photon energies. The X-rays scattered from the sample are received at a plurality of scattering angles using one or more sensors, which generate output signals indicative of the respective photon energies of the X-rays photons that are incident thereon. The output signals are analyzed based on the photon energies so as to determine a scattering profile of the sample at a selected photon energy within the range.

REFERENCES:
patent: 4725963 (1988-02-01), Taylor et al.
patent: 4989226 (1991-01-01), Woodbury et al.
patent: 5151588 (1992-09-01), Kiri et al.
patent: 5574284 (1996-11-01), Farr
patent: 5619548 (1997-04-01), Koppel
patent: 5740226 (1998-04-01), Komiya et al.
patent: 5923720 (1999-07-01), Barton et al.
patent: 6005915 (1999-12-01), Hossain et al.
patent: 6381303 (2002-04-01), Vu et al.
patent: 6389102 (2002-05-01), Mazor et al.
patent: 6453006 (2002-09-01), Koppel et al.
patent: 6507634 (2003-01-01), Koppel et al.
patent: 6512814 (2003-01-01), Yokhin et al.
patent: 6643354 (2003-11-01), Koppel et al.
patent: 6711232 (2004-03-01), Janik
patent: 6744950 (2004-06-01), Aleksoff
patent: 2001/0028699 (2001-10-01), Iwasaki
patent: 2001/0043668 (2001-11-01), Hayashi et al.
patent: 2002/0097837 (2002-07-01), Fanton et al.
patent: 2002/0110218 (2002-08-01), Koppel et al.
patent: 2004/0052330 (2004-03-01), Koppel et al.
Chihab et al., “New Apparatus for Grazing X-Ray Reflectometry in the Angle-Resolved Dispersive Mode”, Journal of Applied Crystallography 22 (1989), p. 460.
XTF5011 Tube, Produced by Oxford Instruments of Scotts Valley, California. Jun. 1999.
Doubly-Bent Focusing Crystal Optic, Produced by XOS Inc., of Albany, New York. Jul. 2000.
Wiener et al., “Characterization of Titanium Nitride Layers by Grazing-Emission X-Ray Fluorescence Spectrometry”, in Applied Surface Science 125 (1998), p. 129.
Model S7032-0908N array, Produced by Hamamatsu, of Hamamatsu City, Japan. May 2000.
J. Spear, “Metrology for low-k materials”, Silknet Aliance, 2003.
J.R. Levine Parrill, et al, “GISAXS—Glancing Incidence Small Angle X-ray Scattering”, Journal de Physique IV 3 (Dec. 1993), pp. 411-417.
Jaklevic, et al., “High Rate X-Ray Fluorescence Analysis by Pulsed Excitation”, IEEE Transactions on Nuclear Science NS-19:3 (1972), pp. 392-395.
Jaklevic, et al., “Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers”, Advances in X-Ray Analysis 15 (1972), pp. 266-275.
Jaklevic, et al., “Energy Dispersive X-Ray Fluorescence Spectrometry Using Pulsed X-Ray Excitation”, Advances in X-Ray Analysis 19 (1976).
Wormington, Characterization of Pore Size Distribution in Low k Dielectrics Using X-ray Reflectivity , presented at the Sematech Gate Stack Engineering Workshop (Austin, Texas, May 2, 2002).
Ito, “X-ray Scattering Method for Determining Pore-Size Distribution in Low-k Thin Films”, Presented at the International Sematech Ultra-Low-k Workshop (San Francisco, CA, Jun. 6-7, 2002).
N. Wu, et al, “Substepping and its Application to HST Imaging”, Jul. 28, 2003.
Holy et al., “High Resolution X-ray Scattering from Thin Films and Multilayers”, Springer Verlag 1999, pp. 18-21.

Affiliated with

Also associated with

Rating

X-ray scattering with a polychromatic source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray scattering with a polychromatic source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray scattering with a polychromatic source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3558760