X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and

Details X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and

1979-02-22

1980-09-30

Robinson, Ellis P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

427 431, 20415916, 428451, 428522, 430280, 430286, 430910, 525208, G03C 171, B05D 306

Patent

active

042256640

ABSTRACT:
A mixture of poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate), with the latter forming between 1 percent and 20 percent by weight, of the total polymer mixture, has been found to form an x-ray resist having adhesive and resolving properties superior to those of poly(2,3-dichloro-1-propyl acrylate) which is a good x-ray resist material. Superior properties of the mixture are attributed to the fact that the two polymers form a compatible polymer mixture which is a relatively rare and unpredictable event in polymer chemistry.

REFERENCES:
patent: 4061829 (1977-12-01), Taylor
patent: 4068018 (1978-01-01), Hashimoto
patent: 4096290 (1978-06-01), Fredericks
patent: 4125672 (1978-11-01), Kakuchi
patent: 4130424 (1978-12-01), Feit
patent: 4133907 (1979-01-01), Brewer
G. N. Taylor, "Sensitive Chlorine-Containing Resists for X-ray Lithography," Poly. Eng. and Sci., Jun. 1977, vol. 17, No. 6, pp. 420-429.
L. F. Thompson, "Lithography and Radiation Chem. of Epoxy Containing Negative Electron Resists," Poly. Eng. and Sci., 14, pp. 529-533, (Jul. 1974).
Sonja Krause, "Polymer Compatibility," J. Macromol. Sci.-Revs. in Macromol. Chem., C7 (2), pp. 251, 292-309, (1972).

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