X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-10-31
2006-10-31
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S083000, C378S086000, C378S088000, C378S089000
Reexamination Certificate
active
07130376
ABSTRACT:
A method for inspection of a sample that includes a first layer having a known reflectance property and a second layer formed over the first layer. The method includes directing radiation toward a surface of the sample and sensing the radiation reflected from the surface so as to generate a reflectance signal as a function of elevation angle relative to the surface. A feature due to reflection of the radiation from the first layer is identified in the reflectance signal. The reflectance signal is calibrated responsively to the identified feature and to the known reflectance property of the first layer. The calibrated reflectance signal is analyzed to determine a characteristic of the second layer. Other enhanced inspection methods are disclosed, as well.
REFERENCES:
patent: 4725963 (1988-02-01), Taylor et al.
patent: 5151588 (1992-09-01), Kiri et al.
patent: 5574284 (1996-11-01), Farr
patent: 5619548 (1997-04-01), Koppel
patent: 5740226 (1998-04-01), Komiya et al.
patent: 5923720 (1999-07-01), Barton et al.
patent: 5949847 (1999-09-01), Terada et al.
patent: 6192103 (2001-02-01), Wormington et al.
patent: 6381303 (2002-04-01), Vu et al.
patent: 6389102 (2002-05-01), Mazor et al.
patent: 6453006 (2002-09-01), Koppel et al.
patent: 6507634 (2003-01-01), Koppel et al.
patent: 6512814 (2003-01-01), Yokhin et al.
patent: 6535575 (2003-03-01), Yokhin
patent: 6639968 (2003-10-01), Yokhin et al.
patent: 6643354 (2003-11-01), Koppel et al.
patent: 6711232 (2004-03-01), Janik
patent: 6744850 (2004-06-01), Fanton et al.
patent: 6744950 (2004-06-01), Aleksoff
patent: 6754305 (2004-06-01), Rosencwaig et al.
patent: 6771735 (2004-08-01), Janik et al.
patent: 6813338 (2004-11-01), Takata et al.
patent: 6895071 (2005-05-01), Yokhin et al.
patent: 6895075 (2005-05-01), Yokhin et al.
patent: 2001/0028699 (2001-10-01), Iwasaki
patent: 2001/0043668 (2001-11-01), Hayashi et al.
patent: 2002/0097837 (2002-07-01), Fanton et al.
patent: 2002/0110218 (2002-08-01), Koppel et al.
patent: 2003/0157559 (2003-08-01), Omote et al.
patent: 2004/0052330 (2004-03-01), Koppel et al.
patent: 2004/0218717 (2004-11-01), Koppel et al.
Chihab et al., “New Apparatus for Grazing X-Ray Reflectometry in the Angle-Resolved Dispersive Mode”, Journal of Applided Cystallography 22 (1989), p. 460.
XTF5011 Tube, Produced by Oxford Instruments of Scotts Valley, California. Jun. 1999.
Doubly-Bent Focusing Crystal Optic, Produced by XOS Inc., of Albany, New York, Jul. 2000.
Wiener et al., “Characterization of Titanium Nitride Layers by Grazing-Emission X-Ray Fluorescence Spectrometry”, in Applided Surface Science 125 (1998), pp. 129-136.
Model S7032-0908N array, Produced by Hamamatsu, of Hamamatsu City, Japan. May 2000.
J. Spear, “Metrology for low-k materials”, Silknet Aliance, 2003.
J.R. Levine Parrill, et al, “GISAXS-Glancing Incidence Small Angle X-ray Scattering”, Journal de Physique IV 3 (Dec. 1993), pp. 411-417.
Jaklevic, et al., “High Rate X-Ray Fluorescence Analysis by Pulsed Excitation”, IEEE Transactions on Nucleara Science NS-19:3 (1972, pp. 392-395.
Jaklevic, et al., “Small X-Ray Tubes for Energy Dispersive Analysis Using Semiconductor Spectrometers”, Advances in X-Ray Analysis 15 (1972), pp. 266-275.
Jaklevic, et al. “Energy Dispersive X-Ray Fluorescence Spectrometry Using Pulsed X-Ray Excitation”, Advances in X-Ray Analysis 19 (1976). pp. 253-265.
Wormington, “Characterization of Pore Size Distribution in Low k Dielectrics Using X-ray Relectivity”, presented at the Sematech Gate Stack Eng. Workshop (Austin, TX, May 2, 2002).
Ito, “X-ray Scattering Method for Determining Pore-Size Distribution in Low-k Think Films”, presented at the Int'l Sematech Ultra-Low-k Workshop (San Francisco, CA, Jun. 6-7, 2002).
N. Wu, et al., “Substepping and its Application to HST Imaging”, Jul. 28, 2003.
Agnihotri Dileep
Berman David
Dikopoltsev Alex
Amster Rothstein & Ebenstein LLP
Glick Edward J.
Jordan Valley Applied Radiation Ltd.
Kao Chih-Cheng Glen
LandOfFree
X-ray reflectometry of thin film layers with enhanced accuracy does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray reflectometry of thin film layers with enhanced accuracy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray reflectometry of thin film layers with enhanced accuracy will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3677668