X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-02-28
1992-10-06
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 43, 378 84, G21K 500
Patent
active
051538989
ABSTRACT:
An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
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Fukuda Yasuaki
Kariya Takao
Kawai Yasuo
Minami Setsuo
Mochizuki Noritaka
Canon Kabushiki Kaisha
Porta David P.
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