X-ray permeable membrane for X-ray lithographic mask

Details X-ray permeable membrane for X-ray lithographic mask X-ray permeable membrane for X-ray lithographic mask

1992-06-16

1993-08-10

Stoll, Robert L.

Compositions

Miscellaneous

264 81, 378 35, 427249, 427255, 427160, 430 5, G21K 500, G03F 900, C23C 1600

Patent

active

052346099

ABSTRACT:
Disclosed is an X-ray-permeable membrane for X-ray lithographic mask for fine patterning in the manufacture of semiconductor devices having good transparency to visible light and exhibiting excellent resistance against high-energy beam irradiation. The membrane has a chemical composition expressed by the formula SiC.sub.x N.sub.y and can be prepared by the thermal CVD method in an atmosphere of a gaseous mixture consisting of gases comprising, as a group, the elements of silicon, carbon and nitrogen such as a ternary combination of silane, propane and ammonia.

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patent: 5061514 (1991-10-01), Boeglin
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