X-ray permeable membrane for X-ray lithographic mask

Details X-ray permeable membrane for X-ray lithographic mask X-ray permeable membrane for X-ray lithographic mask

1991-11-06

1993-09-21

Weisstuch, Aaron

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

20419226, 378 35, G03F 100, G03F 900, C23C 1434

Patent

active

052468020

ABSTRACT:
An X-ray permeable membrane for an X-ray lithographic mask consisting of an inorganic thin film obtained by the sputtering method using a target and consisting of silicon carbide and carbon, said target consisting of silicon carbide and carbon in a molar ratio of 99.9:0.1 to 70:30, having a transmission of at least 37% at a light wavelength of 633 nm and a tensile strength of 1.times.10.sup.8 to 1.times.10.sup.10 dyn/cm.sup.2, and the membrane consisting of a silicon carbide constituted form silicon and carbon in a molar ratio in the range form 50.1:49.9 to 49.9:50.1.

REFERENCES:
patent: 5089085 (1992-02-01), Kashida et al.
patent: 5098515 (1992-03-01), Kashida

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