X-ray optical apparatus and device fabrication method

Details X-ray optical apparatus and device fabrication method X-ray optical apparatus and device fabrication method

1997-04-23

1999-04-20

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

058964380

ABSTRACT:
An X-ray optical apparatus includes an illumination optical system, including (i) a deflection-scanning device for deflection-scanning an X-ray beam and (ii) a concave mirror for reflecting the deflection-scanned X-ray beam, for illuminating an object with the reflected X-ray beam, and a projection optical system for projecting an image of the object illuminated by the illumination optical system. Also disclosed is a device fabrication method for reduction-projecting a pattern of a mask onto a wafer to expose and transfer the pattern from the mask to the wafer.

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