X-ray metrology and alignment detection system

Details X-ray metrology and alignment detection system X-ray metrology and alignment detection system

1991-10-11

1992-12-01

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378205, G21K 500

Patent

active

051685132

ABSTRACT:
This is a process for aligning an x-ray lithography system including an x-ray mask and a work piece with an alignment mark. A zone plate lens is used in the x-ray mask. X-rays are directed through the zone plate lens to the alignment mark to detect when the lens is aligned with the mark by emission of photoelectrons generated by the work piece in response to the x-rays. The change of current when the x-ray beam crosses a feature on the alignment mark is detected by a properly biased zone plate or grating. The alignment mark can be an etched slot or a metal feature.

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patent: 5074667 (1991-12-01), Miyatake

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