X-ray mask with a micro-actuator

Details X-ray mask with a micro-actuator X-ray mask with a micro-actuator

2002-01-16

2002-12-31

Dunn, Drew A. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S035000

Reexamination Certificate

active

06501824

ABSTRACT:

FIELD OF THE INVENTION
The present invention relates to an X-ray mask for use in an X-ray LIGA process; and, more particularly, to an X-ray mask with a micro-actuator for precisely controlling a position of the X-ray mask to generate a three-dimensional microstructure.
BACKGROUND OF THE INVENTION
In recent years, an X-ray LIGA technology by an X-ray mask is widely employed to fabricate a three-dimensional microstructure.
The term ‘LIGA’is an acronym of German words Lithographie, Galvanoformung and Abformung which imply lithography, electroplating and molding, respectively. Therefore, the X-ray LIGA refers to a micro-fabrication technology for forming a microstructure through an X-ray lithography process, an electroplating process and a molding process.
By using the X-ray LIGA technology, a microstructure of vertical side wall with a height ranging from tens of &mgr;m to several cm can be obtained. Since the roughness of the microstructure of vertical side wall is hundreds of Å, the microstructure fabricated by the X-ray LIGA process is highly precise.
The X-ray mask is a device for selectively eradiating the X-ray during the X-ray lithography process. The X-ray mask is located between a photoresist film and an X-ray source.
Referring to
FIG. 1
, there is provided a schematic front view of a conventional X-ray mask. The conventional X-ray mask includes a thin silicon/silicon nitride membrane
1
and an Au X-ray absorber
2
formed on the membrane
1
. The X-ray permeates the silicon/silicon nitride membrane
1
without experiencing any energy loss but cannot pass through a region wherein the X-ray absorber
2
is prepared. Accordingly, the shape of the X-ray absorber
2
is transferred to a PMMA (polymethylmethacrylate) substrate or the photoresist film (not shown). The membrane
1
is supported by a mask holder
3
. Above the X-ray mask is located the X-ray source (not shown) while beneath the X-ray mask is prepared the PMMA substrate or the photoresist film to be exposed to the X-ray.
Though the conventional X-ray mask as described above shows a great efficiency in fabricating a simple microstructure having a vertical sidewall, a three-dimensional microstructure with a non-vertical sidewall may not be easily fabricated by using the conventional X-ray mask. In order to obtain various three-dimensional microstructure by using the conventional X-ray mask, the X-ray mask or the PMMA substrate should be circularly or horizontally moved relative to the X-ray source. Accordingly, an additional precision equipment is required and, thus, the volume and the cost of the X-ray mask may not be reduced below a certain level.
SUMMARY OF THE INVENTION
It is, therefore, an object of the present invention to provide an X-ray mask incorporating therein a micro-actuator capable of directly operating the X-ray mask.
In accordance with the present invention, there is provided an X-ray mask with a micro-actuator including:
a mask portion including a thin shuttle mass and an X-ray absorber attached on the shuttle mass;
a mask holder portion formed around the mask portion with a predetermined distance maintained therebetween;
at least one elasticized supporter for elastically connecting the mask portion and the mask holder portion; and
a micro-actuator unit prepared between the mask portion and the mask holder portion for precisely controlling a position of the mask portion when a voltage is applied.


REFERENCES:
patent: 6379871 (2002-04-01), Suzuki
patent: 6387578 (2002-05-01), Lian et al.

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